IBM Journal of Research and Development, Volume 43, 1999

Volume 43, Number 1 & 2, 1999

• Yue Kuo:
  Preface. 3-4
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• Donna R. Cote, Son Van Nguyen, Anthony K. Stamper, Douglas S. Armbrust, Dirk Tobben, Richard A. Conti, Gill Yong Lee:
  Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits. 5-38
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• Michael Armacost, Peter D. Hoh, Richard Wise, Wendy Yan, Jeffrey J. Brown, John H. Keller, George A. Kaplita, Scott D. Halle, K. Paul Muller, Munir D. Naeem, Senthil Srinivasan, Hung Y. Ng, Martin Gutsche, Alois Gutmann, Bruno Spuler:
  Plasma-etching processes for ULSI semiconductor circuits. 39-72
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• Yue Kuo, Kenji Okajima, Masatomo Takeichi:
  Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays. 73-88
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• R. Hsiao:
  Fabrication of magnetic recording heads and dry etching of head materials. 89-102
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• Stephen J. Fonash:
  Plasma processing damage in etching and deposition. 103-108
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• Son Van Nguyen:
  High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits. 109-126
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• Dennis W. Hess:
  Plasma-assisted oxidation, anodization, and nitridation of silicon. 127-146
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• Alfred Grill:
  Plasma-deposited diamondlike carbon and related materials. 147-162
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• Stephen M. Rossnagel:
  Sputter deposition for semiconductor manufacturing. 163-180
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• Gottlieb S. Oehrlein, Marcus F. Doemling, Bernd E. E. Kastenmeier, Peter J. Matsuo, Neal R. Rueger, Marc Schaepkens, Theodorus E. F. M. Standaert:
  Surface science issues in plasma etching. 181-198
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• Satoshi Hamaguchi:
  Modeling and simulation methods for plasma processing. 199-216
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Volume 43, Number 3, 1999

• Douglas A. Buchanan:
  Preface. 243-244
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• Douglas A. Buchanan:
  Scaling the gate dielectric: Materials, integration, and reliability. 245-264
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• Evgeni P. Gusev, Hsu-Chang Lu, Eric L. Garfunkel, Torgny Gustafsson, Martin L. Green:
  Growth and characterization of ultrathin nitrided silicon oxide films. 265-286
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• Kenneth A. Ellis, Robert A. Buhrman:
  Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics. 287-300
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• Gerald Lucovsky:
  Ultrathin nitrided gate dielectrics: Plasma processing, chemical characterization, performance, and reliability. 301-326
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• Shih-Hsien Lo, Douglas A. Buchanan, Yuan Taur:
  Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides. 327-338
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• Marc M. Heyns, Twan Bearda, Ingrid Cornelissen, Stefan De Gendt, Robin Degraeve, Guido Groeseneken, Conny Kenens, D. Martin Knotter, Lee M. Loewenstein, Paul W. Mertens, Sofie Mertens, Marc Meuris, Tanya Nigam, Marc Schaekers, Ivo Teerlinck, Wilfried Vandervorst, Rita Vos, Klaus Wolke:
  Cost-effective cleaning and high-quality thin gate oxides. 339-350
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• Harald F. Okorn-Schmidt:
  Characterization of silicon surface preparation processes for advanced gate dielectrics. 351-366
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• David E. Kotecki, John D. Baniecki, Hua Shen, Robert B. Laibowitz, Katherine L. Saenger, Jingyu Jenny Lian, Thomas M. Shaw, Satish D. Athavale, Cyril Cabral Jr., Peter R. Duncombe, Martin Gutsche, Gerhard Kunkel, Young-Jin Park, Yun-Yu Wang, Richard Wise:
  (Ba, Sr)TiO3 dielectrics for future stacked- capacitor DRAM. 367-382
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• Stephen A. Campbell, Hyeon-Seag Kim, David C. Gilmer, Boyong He, Tiezhong Ma, Wayne L. Gladfelter:
  Titanium dioxide (TiO2)-based gate insulators. 383-392
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• Terence B. Hook, Jay S. Burnham, Ronald J. Bolam:
  Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations. 393-406
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• W. W. (Bill) Abadeer, Asmik Bagramian, David W. Conkle, Charles W. Griffin, Eric Langlois, Brian F. Lloyd, Raymond P. Mallette, James E. Massucco, Jonathan M. McKenna, Steven W. Mittl, Philip H. Noel:
  Key measurements of ultrathin gate dielectric reliability and in-line monitoring. 407-416
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Volume 43, Number 4, 1999

• Cesar A. Gonzales:
  Preface. 450-452
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• Cesar A. Gonzales, Hangu Yeo, Chung J. Kuo:
  Requirements for motion-estimation search range in MPEG-2 coded video. 453-470
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• Peter H. Westerink, Rajesh Rajagopalan, Cesar A. Gonzales:
  Two-pass MPEG-2 variable-bit-rate encoding. 471-488
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• Nader Mohsenian, Rajesh Rajagopalan, Cesar A. Gonzales:
  Single-pass constant- and variable-bit-rate MPEG-2 video compression. 489-510
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• Lilla Böröczky, Agnes Y. Ngai, Edward F. Westermann:
  Statistical multiplexing using MPEG-2 video encoders. 511-520
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• Richard E. Anderson, Eric M. Foster:
  Design of an MPEG-2 transport demultiplexor core. 521-532
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• Charlotte A. Reed, Dana J. Thygesen:
  Pseudorandom verification and emulation of an MPEG-2 transport demultiplexor. 533-544
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• Wai-Man Lam, Ligang Lu:
  Memory reduction for HDTV decoders. 545-554
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• Nelson R. Manohar, Ashish Mehra, Marc Willebeek-LeMair, Mahmoud Naghshineh:
  A framework for programmable overlay multimedia networks. 555-578
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• Rolf Hilgendorf, Gerald J. Heim, Wolfgang Rosenstiel:
  Evaluation of branch-prediction methods on traces from commercial applications. 579-594
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Volume 43, Number 5 & 6, 1999

• Kevin Carswell, Cyril Price:
  Preface. 619-620
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• George A. Katopis, Wiren D. Becker, Toufie R. Mazzawy, Howard H. Smith, Charles K. Vakirtzis, Scott A. Kuppinger, Bhupindra Singh, Phillip C. Lin, John Bartells Jr., Gregory V. Kihlmire, Panangattur N. Venkatachalam, Herb I. Stoller, Jason L. Frankel:
  MCM technology and design for the S/390 G5 system. 621-650
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• Richard F. Rizzolo, Guenter Hinkel, Steven Michnowski, Thomas J. McPherson, Allen J. Sutcliffe:
  System performance management for the S/390 Parallel Enterprise Server G5. 651-660
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• Paul R. Turgeon, Pak-kin Mak, Michael A. Blake, Michael F. Fee, Carl B. Ford III, Patrick J. Meaney, A. E. (Rick) Seigler, William Wu Shen:
  The S/390 G5/G6 binodal cache. 661-670
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• Mark A. Check, Timothy J. Slegel:
  Custom S/390 G5 and G6 microprocessors. 671-680
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• Robert M. Averill III, Keith G. Barkley, Michael A. Bowen, Peter J. Camporese, Allan H. Dansky, Robert F. Hatch, Dale E. Hoffman, Mark D. Mayo, Scott A. McCabe, Timothy G. McNamara, Thomas J. McPherson, Gregory A. Northrop, Leon J. Sigal, Howard H. Smith, David A. Webber, Patrick M. Williams:
  Chip integration methodology for the IBM S/390 G5 and G6 custom microprocessors. 681-706
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• Eric M. Schwarz, Christopher A. Krygowski:
  The S/390 G5 floating-point unit. 707-722
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• Paul H. Abbott, David G. Brush, Clarence W. Clark III, Chris J. Crone, John R. Ehrman, Graham W. Ewart, Clark A. Goodrich, Michel Hack, John S. Kapernick, Brian J. Minchau, William C. Shepard, Ronald M. Smith Sr., Richard Tallman, Steven Walkowiak, Akio Watanabe, W. Romney White:
  Architecture and software support in IBM S/390 Parallel Enterprise Servers for IEEE Floating-Point arithmetic. 723-760
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• Randall J. Easter, Edward W. Chencinski, Edward D'Avignon, Seth R. Greenspan, William A. Merz, Clark D. Norberg:
  S/390 Parallel Enterprise Server CMOS Cryptographic Coprocessor. 761-776
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• Phil C. Yeh, Ronald M. Smith Sr.:
  S/390 CMOS Cryptographic Coprocessor Architecture: Overview and design considerations. 777-794
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• Thomas A. Gregg, Kulwant M. Pandey, Richard K. Errickson:
  The Integrated Cluster Bus for the IBM S/390 Parallel Sysplex. 795-806
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• Casimer M. DeCusatis, Daniel J. Stigliani Jr., Walter L. Mostowy, Mark E. Lewis, David B. Petersen, Noshir R. Dhondy:
  Fiber optic interconnects for the IBM S/390 Parallel Enterprise Server G5. 807-828
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• Joseph M. Hoke, Paul W. Bond, Tin-chee Lo, Frank S. Pidala, Gary Steinbrueck:
  Self-timed interface for S/390 I/O subsystem interconnection. 829-846
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• Kathryn M. Jackson, Keith N. Langston:
  IBM S/390 storage hierarchy - G5 and G6 performance considerations. 847-854
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• Chitta L. Rao, Gary M. King, Barbara A. Weiler:
  Integrated Cluster Bus performance for the IBM S/390 Parallel Sysplex. 855-862
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• Lisa Spainhower, Thomas A. Gregg:
  IBM S/390 Parallel Enterprise Server G5 fault tolerance: A historical perspective. 863-874
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• Michael Mueller, Luiz C. Alves, Wolfgang Fischer, Myron L. Fair, Indravadan N. Modi:
  RAS strategy for IBM S/390 G5 and G6. 875-888
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• Thomas Buechner, Rolf Fritz, Peter Guenther, Markus M. Helms, Kirk D. Lamb, Manfred Loew, Thomas Schlipf, Manfred H. Walz:
  Event monitoring in highly complex hardware systems. 889-898
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• Peilin Song, Franco Motika, Daniel R. Knebel, Richard F. Rizzolo, Mary P. Kusko:
  S/390 G5 CMOS microprocessor diagnostics. 899-914
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• Gary A. Van Huben, Timothy G. McNamara, Thomas E. Gilbert:
  PLL modeling and verification in a cycle-simulation environment. 915-926
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