| 1999 |
|---|
| 2 | EE | Donna R. Cote,
Son Van Nguyen,
Anthony K. Stamper,
Douglas S. Armbrust,
Dirk Tobben,
Richard A. Conti,
Gill Yong Lee:
Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits.
IBM Journal of Research and Development 43(1): 5-38 (1999) |
| 1995 |
|---|
| 1 | | Donna R. Cote,
Son Van Nguyen,
William J. Cote,
Scott L. Pennington,
Anthony K. Stamper,
Dragan V. Podlesnik:
Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM.
IBM Journal of Research and Development 39(4): 437-464 (1995) |
