| |
| 1999 | ||
|---|---|---|
| 1 | EE | Donna R. Cote, Son Van Nguyen, Anthony K. Stamper, Douglas S. Armbrust, Dirk Tobben, Richard A. Conti, Gill Yong Lee: Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits. IBM Journal of Research and Development 43(1): 5-38 (1999) |
| 1 | Douglas S. Armbrust | [1] |
| 2 | Richard A. Conti | [1] |
| 3 | Donna R. Cote | [1] |
| 4 | Gill Yong Lee | [1] |
| 5 | Son Van Nguyen | [1] |
| 6 | Anthony K. Stamper | [1] |