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Stephen A. Campbell

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2005
2EEY. G. Fedorenko, L. Truong, V. V. Afanasev, A. Stesmans, Z. Zhang, Stephen A. Campbell: Impact of nitrogen incorporation on interface states in (100)Si/HfO2. Microelectronics Reliability 45(5-6): 802-805 (2005)
1999
1EEStephen A. Campbell, Hyeon-Seag Kim, David C. Gilmer, Boyong He, Tiezhong Ma, Wayne L. Gladfelter: Titanium dioxide (TiO2)-based gate insulators. IBM Journal of Research and Development 43(3): 383-392 (1999)

Coauthor Index

1V. V. Afanasev [2]
2Y. G. Fedorenko [2]
3David C. Gilmer [1]
4Wayne L. Gladfelter [1]
5Boyong He [1]
6Hyeon-Seag Kim [1]
7Tiezhong Ma [1]
8A. Stesmans [2]
9L. Truong [2]
10Z. Zhang [2]

Colors in the list of coauthors

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)