Stephen A. Campbell

2005
2	EE	Y. G. Fedorenko, L. Truong, V. V. Afanasev, A. Stesmans, Z. Zhang, Stephen A. Campbell: Impact of nitrogen incorporation on interface states in (100)Si/HfO2. Microelectronics Reliability 45(5-6): 802-805 (2005)
1999
1	EE	Stephen A. Campbell, Hyeon-Seag Kim, David C. Gilmer, Boyong He, Tiezhong Ma, Wayne L. Gladfelter: Titanium dioxide (TiO2)-based gate insulators. IBM Journal of Research and Development 43(3): 383-392 (1999)

Coauthor Index

1	V. V. Afanasev	[2]
2	Y. G. Fedorenko	[2]
3	David C. Gilmer	[1]
4	Wayne L. Gladfelter	[1]
5	Boyong He	[1]
6	Hyeon-Seag Kim	[1]
7	Tiezhong Ma	[1]
8	A. Stesmans	[2]
9	L. Truong	[2]
10	Z. Zhang	[2]

Colors in the list of coauthors