Kenneth A. Ellis
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1999
1
EE
Kenneth A. Ellis,
Robert A. Buhrman
: Nitrous oxide (N2O) processing for silicon oxynitride gate dielectrics.
IBM Journal of Research and Development 43
(3): 287-300 (1999)
Coauthor
Index
1
Robert A. Buhrman
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1
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Copyright ©
Sun May 17 03:24:02 2009 by
Michael Ley
(
ley@uni-trier.de
)
