| 2006 |
|---|
| 5 | EE | S. Chatterjee,
Yue Kuo,
J. Lu,
J.-Y. Tewg,
P. Majhi:
Electrical reliability aspects of HfO2 high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress.
Microelectronics Reliability 46(1): 69-76 (2006) |
| 1999 |
|---|
| 4 | EE | Yue Kuo:
Preface.
IBM Journal of Research and Development 43(1): 3-4 (1999) |
| 3 | EE | Yue Kuo,
Kenji Okajima,
Masatomo Takeichi:
Plasma processing in the fabrication of amorphous silicon thin-film-transistor arrays.
IBM Journal of Research and Development 43(1): 73-88 (1999) |
| 1998 |
|---|
| 2 | EE | Evan G. Colgan,
Paul M. Alt,
Robert L. Wisnieff,
Peter M. Fryer,
Eileen A. Galligan,
William S. Graham,
Paul F. Greier,
Raymond R. Horton,
Harold Ifill,
Leslie C. Jenkins,
Richard A. John,
Richard I. Kaufman,
Yue Kuo,
Alphonso P. Lanzetta,
Kenneth F. Latzko,
Frank R. Libsch,
Shui-Chih Alan Lien,
Steven E. Millman,
Robert W. Nywening,
Robert J. Polastre,
Carl G. Powell,
Rick A. Rand,
John J. Ritsko,
Mary B. Rothwell,
John L. Staples,
Kevin W. Warren,
John S. Wilson,
Steven L. Wright:
A 10.5-in.-diagonal SXGA active-matrix display.
IBM Journal of Research and Development 42(3): 427-444 (1998) |
| 1992 |
|---|
| 1 | | Yue Kuo:
Reactive ion etching technology in thin-film-transistor processing.
IBM Journal of Research and Development 36(1): 69-75 (1992) |
