Gottlieb S. Oehrlein

1999
2	EE	Gottlieb S. Oehrlein, Marcus F. Doemling, Bernd E. E. Kastenmeier, Peter J. Matsuo, Neal R. Rueger, Marc Schaepkens, Theodorus E. F. M. Standaert: Surface science issues in plasma etching. IBM Journal of Research and Development 43(1): 181-198 (1999)
1992
1		Gottlieb S. Oehrlein, John F. Rembetski: Plasma-based dry etching techniques in the silicon integrated circuit technology. IBM Journal of Research and Development 36(2): 140-157 (1992)

Coauthor Index

1	Marcus F. Doemling	[2]
2	Bernd E. E. Kastenmeier	[2]
3	Peter J. Matsuo	[2]
4	John F. Rembetski	[1]
5	Neal R. Rueger	[2]
6	Marc Schaepkens	[2]
7	Theodorus E. F. M. Standaert	[2]

Colors in the list of coauthors