1999 |
2 | EE | Michael Armacost,
Peter D. Hoh,
Richard Wise,
Wendy Yan,
Jeffrey J. Brown,
John H. Keller,
George A. Kaplita,
Scott D. Halle,
K. Paul Muller,
Munir D. Naeem,
Senthil Srinivasan,
Hung Y. Ng,
Martin Gutsche,
Alois Gutmann,
Bruno Spuler:
Plasma-etching processes for ULSI semiconductor circuits.
IBM Journal of Research and Development 43(1): 39-72 (1999) |
1 | EE | David E. Kotecki,
John D. Baniecki,
Hua Shen,
Robert B. Laibowitz,
Katherine L. Saenger,
Jingyu Jenny Lian,
Thomas M. Shaw,
Satish D. Athavale,
Cyril Cabral Jr.,
Peter R. Duncombe,
Martin Gutsche,
Gerhard Kunkel,
Young-Jin Park,
Yun-Yu Wang,
Richard Wise:
(Ba, Sr)TiO3 dielectrics for future stacked- capacitor DRAM.
IBM Journal of Research and Development 43(3): 367-382 (1999) |