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Son Van Nguyen

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1999
3EESon Van Nguyen: High-density plasma chemical vapor deposition of silicon-based dielectric films for integrated circuits. IBM Journal of Research and Development 43(1): 109-126 (1999)
2EEDonna R. Cote, Son Van Nguyen, Anthony K. Stamper, Douglas S. Armbrust, Dirk Tobben, Richard A. Conti, Gill Yong Lee: Plasma-assisted chemical vapor deposition of dielectric thin films for ULSI semiconductor circuits. IBM Journal of Research and Development 43(1): 5-38 (1999)
1995
1 Donna R. Cote, Son Van Nguyen, William J. Cote, Scott L. Pennington, Anthony K. Stamper, Dragan V. Podlesnik: Low-temperature chemical vapor deposition processes and dielectrics for microelectronic circuit manufacturing at IBM. IBM Journal of Research and Development 39(4): 437-464 (1995)

Coauthor Index

1Douglas S. Armbrust [2]
2Richard A. Conti [2]
3Donna R. Cote [1] [2]
4William J. Cote [1]
5Gill Yong Lee [2]
6Scott L. Pennington [1]
7Dragan V. Podlesnik [1]
8Anthony K. Stamper [1] [2]
9Dirk Tobben [2]

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