| |
| 2005 | ||
|---|---|---|
| 2 | EE | Terence B. Hook, Ronald J. Bolam, William Clark, Jay S. Burnham, Nivo Rovedo, Laura Schutz: Negative bias temperature instability on three oxide thicknesses (1.4/2.2/5.2 nm) with nitridation variations and deuteration. Microelectronics Reliability 45(1): 47-56 (2005) |
| 1999 | ||
| 1 | EE | Terence B. Hook, Jay S. Burnham, Ronald J. Bolam: Nitrided gate oxides for 3.3-V logic application: Reliability and device design considerations. IBM Journal of Research and Development 43(3): 393-406 (1999) |
| 1 | Jay S. Burnham | [1] [2] |
| 2 | William Clark | [2] |
| 3 | Terence B. Hook | [1] [2] |
| 4 | Nivo Rovedo | [2] |
| 5 | Laura Schutz | [2] |