| 1999 |
|---|
| 4 | EE | Douglas A. Buchanan:
Preface.
IBM Journal of Research and Development 43(3): 243-244 (1999) |
| 3 | EE | Douglas A. Buchanan:
Scaling the gate dielectric: Materials, integration, and reliability.
IBM Journal of Research and Development 43(3): 245-264 (1999) |
| 2 | EE | Shih-Hsien Lo,
Douglas A. Buchanan,
Yuan Taur:
Modeling and characterization of quantization, polysilicon depletion, and direct tunneling effects in MOSFETs with ultrathin oxides.
IBM Journal of Research and Development 43(3): 327-338 (1999) |
| 1995 |
|---|
| 1 | | Yuan Taur,
Yuh-Jier Mii,
David J. Frank,
H.-S. Philip Wong,
Douglas A. Buchanan,
Shalom J. Wind,
Stephen A. Rishton,
Watson A. Sai-Halasz,
Edward J. Nowak:
CMOS scaling into the 21st century: 0.1 µm and beyond.
IBM Journal of Research and Development 39(1-2): 245-260 (1995) |
