Volume 45,
Number 1,
2001
- Jane M. Shaw, Paul F. Seidler:
Organic electronics: Introduction.
3-10
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- Christos D. Dimitrakopoulos, Debra J. Mascaro:
Organic thin-film transistors: A review of recent advances.
11-28
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- David B. Mitzi, Konstantinos Chondroudis, Cherie R. Kagan:
Organic-inorganic electronics.
29-46
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- Christopher B. Murray, Shouheng Sun, Wolfgang Gaschler, Hugh Doyle, Theodore A. Betley, Cherie R. Kagan:
Colloidal synthesis of nanocrystals and nanocrystal superlattices.
47-56
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- Marie Angelopoulos:
Conducting polymers in microelectronics.
57-76
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- Walter Riess, Heike Riel, Tilman Beierlein, Wolfgang Brütting, Peter Müller, Paul F. Seidler:
Influence of trapped and interfacial charges in organic multilayer light-emitting devices.
77-88
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- Santos F. Alvarado, Laura Rossi, Peter Müller, Paul F. Seidler, Walter Riess:
STM-excited electroluminescence and spectroscopy on organic materials for display applications.
89-100
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- Alessandro Curioni, Wanda Andreoni:
Computer simulations for organic light-emitting diiodes.
101-114
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- Webster E. Howard, Olivier F. Prache:
Microdisplays based upon organic light-emitting diodes.
115-
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Volume 45,
Number 2,
2001
- Richard E. Harper:
Preface.
187-190
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- Elbert C. Hu, Philippe Joubert, Robert B. King, Jason D. LaVoie, John M. Tracey:
Adaptive Fast Path Architecture.
191-206
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- Bishop Brock, Gary D. Carpenter, Eli Chiprout, Mark E. Dean, Philippe L. De Backer, E. N. Elnozahy, Hubertus Franke, Mark Giampapa, David Glasco, James L. Peterson, Ramakrishnan Rajamony, Rajan Ravindran, Freeman L. Rawson III, Ronald L. Rockhold, Juan Rubio:
Experience with building a commodity Intel-based ccNUMA system.
207-228
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- Ashwini K. Nanda, Anthony-Trung Nguyen, Maged M. Michael, Douglas J. Joseph:
High-throughout coherence control and hardware messaging in Everest.
229-244
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- Peter A. Franaszek, Philip Heidelberger, Dan E. Poff, John T. Robinson:
Algorithms and data structures for compressed-memory machines.
245-258
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- Peter A. Franaszek, John T. Robinson:
On internal organization in compressed random-access memories.
259-270
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- R. Brett Tremaine, Peter A. Franaszek, John T. Robinson, Charles O. Schulz, T. Basil Smith, Michael E. Wazlowski, P. Maurice Bland:
IBM Memory Expansion Technology (MXT).
271-286
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- Bülent Abali, Hubertus Franke, Dan E. Poff, Robert A. Saccone Jr., Charles O. Schulz, Lorraine Herger, T. Basil Smith:
Memory Expansion Technology (MXT): Software support and performance.
287-302
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- T. Basil Smith, Bülent Abali, Dan E. Poff, R. Brett Tremaine:
Memory Expansion Technology (MXT): Competitive impact.
303-310
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- Vittorio Castelli, Richard E. Harper, Philip Heidelberger, Steven W. Hunter, Kishor S. Trivedi, Kalyanaraman Vaidyanathan, William P. Zeggert:
Proactive management of software aging.
311-332
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Volume 45,
Number 3 & 4,
2001
- William C. Swope, James M. Coffin, Barry Robson:
Preface.
363-366
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- Keiji Morokuma, Djamaladdin G. Musaev, Thom Vreven, Harold Basch, Maricel Torrent, Dmitry V. Khoroshun:
Model studies of the structures, reacitivities, and reaction mechanisms of metalloenzymes.
367-396
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- Wanda Andreoni, Alessandro Curioni, Tiziana Mordasini:
DFT-based molecular dynamics as a new tool for computational biology: First applications and perspective.
397-408
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- Lulu Huang, Lou Massa, Jerome Karle:
Quantum crystallography, a developing area of computational chemistry extending to macromolecules.
409-416
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- Gary S. D. Ayton, Scott Bardenhagen, Patrick McMurtry, Deborah Sulsky, Gregory A. Voth:
Interfacing molecular dynamics with continuum dynamics in computer simulation: Toward an application to biological membranes.
417-426
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- Nathan A. Baker, David Sept, Michael J. Holst, James Andrew McCammon:
The adaptive multilevel finite element solution of the Poisson-Boltzmann equation on massively parallel computers.
427-438
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- Daniel B. Davison, John F. Burke:
Brute force estimation of the number of human genes using EST clustering as a measure.
439-448
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- Ewan Birney:
Hidden Markov models in biological sequence analysis.
449-454
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- Aris Floratos, Isidore Rigoutsos, Laxmi Parida, Yuan Gao:
DELPHI: A pattern-based method for detecting sequence similarity.
455-474
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- Michael P. Eastwood, Corey Hardin, Zaida Luthey-Schulten, Peter G. Wolynes:
Evaluating protein structure-prediction schemes using energy landscape theory.
475-498
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- Sandeep Kumar, Haim J. Wolfson, Ruth Nussinov:
Protein flexibility and electrostatic interactions.
499-512
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- Chung-Jung Tsai, Buyong Ma, Yuk Yin Sham, Sandeep Kumar, Haim J. Wolfson, Ruth Nussinov:
A hierarchical, building-block-based computational scheme for protein structure prediction.
513-524
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- Boris Fain, Yu Xia, Michael Levitt:
Determination of optimal Chebyshev-expanded hydrophobic discrimination function for globular proteins.
525-532
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- Daniel E. Platt, Laxmi Parida, Yuan Gao, Aris Floratos, Isidore Rigoutsos:
QSAR in grossly underdetermined systems: Opportunities and issues.
533-544
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- Dimitris K. Agrafiotis:
Multiobjective optimization of combinatorial libraries.
545-
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Volume 45,
Number 5,
2001
- George J. Hefferon:
Preface.
603-604
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- A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes:
Review of technology for 157-nm lithography.
605-614
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- Rajinder S. Dhaliwal, William A. Enichen, Steven D. Golladay, Michael S. Gordon, Rodney A. Kendall, Jon E. Lieberman, Hans C. Pfeiffer, David J. Pinckney, Christopher F. Robinson, James D. Rockrohr, Werner Stickel, Eileen V. Tressler:
PREVAIL-Electron projection technology approach for next-generation lithography.
615-638
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- David R. Medeiros, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee Kwong, Christopher K. Magg, Arpan P. Mahorowala, Wayne M. Moreau, Karen E. Petrillo, Marie Angelopoulos:
Recent progress in electron-beam resists for advaced mask-making.
639-650
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- Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham:
TCAD development for lithography resolution enhancement.
651-666
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- William D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Gregory M. Wallraff:
Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists.
667-682
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- Hiroshi Ito:
Dissolution behavior of chemically amplified resist polymers for 248-, 193-, and 157-nm lithography.
683-696
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- Bruno Michel, André Bernard, Alexander Bietsch, Emmanuel Delamarche, Matthias Geissler, David Juncker, Hannes Kind, Jean-Philippe Renault, Hugo E. Rothuizen, Heinz Schmid, Patrick Schmidt-Winkel, Richard Stutz, Heiko Wolf:
Printing meets lithography: Soft approaches to high-resolution patterning.
697-
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Volume 45,
Number 6,
2001
Papers on power and packaging in IBM systems
Regular papers
Copyright © Sun May 17 00:00:13 2009
by Michael Ley (ley@uni-trier.de)
