2001 | ||
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1 | EE | A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes: Review of technology for 157-nm lithography. IBM Journal of Research and Development 45(5): 605-614 (2001) |
1 | A. Keith Bates | [1] |
2 | Theodore M. Bloomstein | [1] |
3 | Theodore H. Fedynyshyn | [1] |
4 | Roderick R. Kunz | [1] |
5 | Vladimir Liberman | [1] |
6 | Mordechai Rothschild | [1] |