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2001 | ||
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1 | EE | William D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Gregory M. Wallraff: Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists. IBM Journal of Research and Development 45(5): 667-682 (2001) |
1 | William D. Hinsberg | [1] |
2 | Frances A. Houle | [1] |
3 | Gregory M. Wallraff | [1] |