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Martha I. Sanchez

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2001
1EEWilliam D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Gregory M. Wallraff: Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists. IBM Journal of Research and Development 45(5): 667-682 (2001)

Coauthor Index

1William D. Hinsberg [1]
2Frances A. Houle [1]
3Gregory M. Wallraff [1]

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