| |
| 2001 | ||
|---|---|---|
| 1 | EE | Lars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham: TCAD development for lithography resolution enhancement. IBM Journal of Research and Development 45(5): 651-666 (2001) |
| 1 | Mark A. Lavin | [1] |
| 2 | William C. Leipold | [1] |
| 3 | Lars Liebmann | [1] |
| 4 | Scott M. Mansfield | [1] |
| 5 | Alfred K. Wong | [1] |