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Lars Liebmann

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2008
7EEShayak Banerjee, Praveen Elakkumanan, Lars Liebmann, Michael Orshansky: Electrically driven optical proximity correction based on linear programming. ICCAD 2008: 473-479
2007
6EELouis Scheffer, Lars Liebmann, Riko Rakojcic, David White: Rules vs tools: what's the right way to address IC manufacturing complexity? ISPD 2007: 75-76
2003
5EELars Liebmann: Layout impact of resolution enhancement techniques: impediment or opportunity? ISPD 2003: 110-117
2002
4EEMark A. Lavin, Lars Liebmann: CAD computation for manufacturability: can we save VLSI technology from itself? ICCAD 2002: 424-431
2001
3EELars Liebmann, Jennifer Lund, Fook-Luen Heng, Ioana Graur: Enabling Alternating Phase Shifted Mask Designs for a Full Logic Gate Level: Design Rules and Design Rule Checking. DAC 2001: 79-84
2EEFook-Luen Heng, Lars Liebmann, Jennifer Lund: Application of automated design migration to alternating phase shift mask design. ISPD 2001: 38-43
1EELars Liebmann, Scott M. Mansfield, Alfred K. Wong, Mark A. Lavin, William C. Leipold, Timothy G. Dunham: TCAD development for lithography resolution enhancement. IBM Journal of Research and Development 45(5): 651-666 (2001)

Coauthor Index

1Shayak Banerjee [7]
2Timothy G. Dunham [1]
3Praveen Elakkumanan [7]
4Ioana Graur [3]
5Fook-Luen Heng [2] [3]
6Mark A. Lavin [1] [4]
7William C. Leipold [1]
8Jennifer Lund [2] [3]
9Scott M. Mansfield [1]
10Michael Orshansky [7]
11Riko Rakojcic [6]
12Louis Scheffer [6]
13David White [6]
14Alfred K. Wong [1]

Colors in the list of coauthors

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)