| |
| 2001 | ||
|---|---|---|
| 2 | EE | A. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes: Review of technology for 157-nm lithography. IBM Journal of Research and Development 45(5): 605-614 (2001) |
| 1997 | ||
| 1 | EE | Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek: Lithography at a wavelength of 193 nm. IBM Journal of Research and Development 41(1&2): 49-56 (1997) |
| 1 | A. Keith Bates | [2] |
| 2 | Theodore M. Bloomstein | [2] |
| 3 | Theodore H. Fedynyshyn | [2] |
| 4 | Anthony R. Forte | [1] |
| 5 | Roderick R. Kunz | [1] [2] |
| 6 | Vladimir Liberman | [2] |
| 7 | Susan C. Palmateer | [1] |
| 8 | Janusz H. C. Sedlacek | [1] |
| 9 | Michael Switkes | [2] |