2001 |
4 | EE | A. Keith Bates,
Mordechai Rothschild,
Theodore M. Bloomstein,
Theodore H. Fedynyshyn,
Roderick R. Kunz,
Vladimir Liberman,
Michael Switkes:
Review of technology for 157-nm lithography.
IBM Journal of Research and Development 45(5): 605-614 (2001) |
1997 |
3 | EE | David E. Seeger,
Douglas C. La Tulipe Jr.,
Roderick R. Kunz,
Cesar M. Garza,
Maureen A. Hanratty:
Thin-film imaging: Past, present, prognosis.
IBM Journal of Research and Development 41(1&2): 105-118 (1997) |
2 | EE | Mordechai Rothschild,
Anthony R. Forte,
Roderick R. Kunz,
Susan C. Palmateer,
Janusz H. C. Sedlacek:
Lithography at a wavelength of 193 nm.
IBM Journal of Research and Development 41(1&2): 49-56 (1997) |
1 | EE | Robert D. Allen,
Gregory M. Wallraff,
Donald C. Hofer,
Roderick R. Kunz:
Photoresists for 193-nm lithography.
IBM Journal of Research and Development 41(1&2): 95-104 (1997) |