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Roderick R. Kunz

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2001
4EEA. Keith Bates, Mordechai Rothschild, Theodore M. Bloomstein, Theodore H. Fedynyshyn, Roderick R. Kunz, Vladimir Liberman, Michael Switkes: Review of technology for 157-nm lithography. IBM Journal of Research and Development 45(5): 605-614 (2001)
1997
3EEDavid E. Seeger, Douglas C. La Tulipe Jr., Roderick R. Kunz, Cesar M. Garza, Maureen A. Hanratty: Thin-film imaging: Past, present, prognosis. IBM Journal of Research and Development 41(1&2): 105-118 (1997)
2EEMordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek: Lithography at a wavelength of 193 nm. IBM Journal of Research and Development 41(1&2): 49-56 (1997)
1EERobert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz: Photoresists for 193-nm lithography. IBM Journal of Research and Development 41(1&2): 95-104 (1997)

Coauthor Index

1Robert D. Allen [1]
2A. Keith Bates [4]
3Theodore M. Bloomstein [4]
4Theodore H. Fedynyshyn [4]
5Anthony R. Forte [2]
6Cesar M. Garza [3]
7Maureen A. Hanratty [3]
8Donald C. Hofer [1]
9Vladimir Liberman [4]
10Susan C. Palmateer [2]
11Mordechai Rothschild [2] [4]
12Janusz H. C. Sedlacek [2]
13David E. Seeger [3]
14Michael Switkes [4]
15Douglas C. La Tulipe Jr. [3]
16Gregory M. Wallraff [1]

Colors in the list of coauthors

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)