Gregory M. Wallraff

2001
2	EE	William D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Gregory M. Wallraff: Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists. IBM Journal of Research and Development 45(5): 667-682 (2001)
1997
1	EE	Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz: Photoresists for 193-nm lithography. IBM Journal of Research and Development 41(1&2): 95-104 (1997)

Coauthor Index

1	Robert D. Allen	[1]
2	William D. Hinsberg	[2]
3	Donald C. Hofer	[1]
4	Frances A. Houle	[2]
5	Roderick R. Kunz	[1]
6	Martha I. Sanchez	[2]

Colors in the list of coauthors