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Gregory M. Wallraff

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2001
2EEWilliam D. Hinsberg, Frances A. Houle, Martha I. Sanchez, Gregory M. Wallraff: Chemical and physical aspects of the post-exposure baking process used for positive-tone chemically amplified resists. IBM Journal of Research and Development 45(5): 667-682 (2001)
1997
1EERobert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz: Photoresists for 193-nm lithography. IBM Journal of Research and Development 41(1&2): 95-104 (1997)

Coauthor Index

1Robert D. Allen [1]
2William D. Hinsberg [2]
3Donald C. Hofer [1]
4Frances A. Houle [2]
5Roderick R. Kunz [1]
6Martha I. Sanchez [2]

Colors in the list of coauthors

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)