| |
| 2001 | ||
|---|---|---|
| 1 | EE | Rajinder S. Dhaliwal, William A. Enichen, Steven D. Golladay, Michael S. Gordon, Rodney A. Kendall, Jon E. Lieberman, Hans C. Pfeiffer, David J. Pinckney, Christopher F. Robinson, James D. Rockrohr, Werner Stickel, Eileen V. Tressler: PREVAIL-Electron projection technology approach for next-generation lithography. IBM Journal of Research and Development 45(5): 615-638 (2001) |
| 1 | Rajinder S. Dhaliwal | [1] |
| 2 | William A. Enichen | [1] |
| 3 | Michael S. Gordon | [1] |
| 4 | Rodney A. Kendall | [1] |
| 5 | Jon E. Lieberman | [1] |
| 6 | Hans C. Pfeiffer | [1] |
| 7 | David J. Pinckney | [1] |
| 8 | Christopher F. Robinson | [1] |
| 9 | James D. Rockrohr | [1] |
| 10 | Werner Stickel | [1] |
| 11 | Eileen V. Tressler | [1] |