| |
| 2001 | ||
|---|---|---|
| 1 | EE | David R. Medeiros, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee Kwong, Christopher K. Magg, Arpan P. Mahorowala, Wayne M. Moreau, Karen E. Petrillo, Marie Angelopoulos: Recent progress in electron-beam resists for advaced mask-making. IBM Journal of Research and Development 45(5): 639-650 (2001) |
| 1 | Marie Angelopoulos | [1] |
| 2 | Ari Aviram | [1] |
| 3 | C. Richard Guarnieri | [1] |
| 4 | Wu-Song Huang | [1] |
| 5 | Christopher K. Magg | [1] |
| 6 | Arpan P. Mahorowala | [1] |
| 7 | David R. Medeiros | [1] |
| 8 | Wayne M. Moreau | [1] |
| 9 | Karen E. Petrillo | [1] |