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Karen E. Petrillo

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2001
1EEDavid R. Medeiros, Ari Aviram, C. Richard Guarnieri, Wu-Song Huang, Ranee Kwong, Christopher K. Magg, Arpan P. Mahorowala, Wayne M. Moreau, Karen E. Petrillo, Marie Angelopoulos: Recent progress in electron-beam resists for advaced mask-making. IBM Journal of Research and Development 45(5): 639-650 (2001)

Coauthor Index

1Marie Angelopoulos [1]
2Ari Aviram [1]
3C. Richard Guarnieri [1]
4Wu-Song Huang [1]
5Ranee Kwong [1]
6Christopher K. Magg [1]
7Arpan P. Mahorowala [1]
8David R. Medeiros [1]
9Wayne M. Moreau [1]

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)