Hans C. Pfeiffer

2001
2	EE	Rajinder S. Dhaliwal, William A. Enichen, Steven D. Golladay, Michael S. Gordon, Rodney A. Kendall, Jon E. Lieberman, Hans C. Pfeiffer, David J. Pinckney, Christopher F. Robinson, James D. Rockrohr, Werner Stickel, Eileen V. Tressler: PREVAIL-Electron projection technology approach for next-generation lithography. IBM Journal of Research and Development 45(5): 615-638 (2001)
1993
1		Timothy R. Groves, John G. Hartley, Hans C. Pfeiffer, Denise Puisto, Donald K. Bailey: Electron beam lithography tool for manufacture of X-ray masks. IBM Journal of Research and Development 37(3): 411-420 (1993)

Coauthor Index

1	Donald K. Bailey	[1]
2	Rajinder S. Dhaliwal	[2]
3	William A. Enichen	[2]
4	Steven D. Golladay	[2]
5	Michael S. Gordon	[2]
6	Timothy R. Groves	[1]
7	John G. Hartley	[1]
8	Rodney A. Kendall	[2]
9	Jon E. Lieberman	[2]
10	David J. Pinckney	[2]
11	Denise Puisto	[1]
12	Christopher F. Robinson	[2]
13	James D. Rockrohr	[2]
14	Werner Stickel	[2]
15	Eileen V. Tressler	[2]

Colors in the list of coauthors