Steven H. Voldman

2005
8	EE	Yoon Huh, Peter Bendix, Kyungjin Min, Jau-Wen Chen, Ravindra Narayan, Larry D. Johnson, Steven H. Voldman: ESD-Induced Internal Core Device Failure: New Failure Modes in System-on-Chip (SoC) Designs, invited. IWSOC 2005: 47-53
7	EE	Steven H. Voldman: A review of latchup and electrostatic discharge (ESD) in BiCMOS RF silicon germanium technologies: Part I - ESD. Microelectronics Reliability 45(2): 323-340 (2005)
6	EE	Steven H. Voldman: A review of CMOS latchup and electrostatic discharge (ESD) in bipolar complimentary MOSFET (BiCMOS) Silicon Germanium technologies: Part II - Latchup. Microelectronics Reliability 45(3-4): 437-455 (2005)
2004
5	EE	Steven H. Voldman: A review of electrostatic discharge (ESD) in advanced semiconductor technology. Microelectronics Reliability 44(1): 33-46 (2004)
2003
4	EE	James S. Dunn, David C. Ahlgren, Douglas D. Coolbaugh, Natalie B. Feilchenfeld, Gregory Freeman, David R. Greenberg, Robert A. Groves, Fernando J. Guarín, Youssef Hammad, Alvin J. Joseph, Louis D. Lanzerotti, Stephen A. St. Onge, Bradley A. Orner, Jae-Sung Rieh, Kenneth J. Stein, Steven H. Voldman, Ping-Chuan Wang, Michael J. Zierak, Seshadri Subbanna, David L. Harame, Dean A. Herman Jr., Bernard S. Meyerson: Foundation of rf CMOS and SiGe BiCMOS technologies. IBM Journal of Research and Development 47(2-3): 101-138 (2003)
3	EE	Sherry Suat Cheng Khoo, Pee Ya Tan, Steven H. Voldman: Microanalysis and electromigration reliability performance of high current transmission line pulse (TLP) stressed copper interconnects. Microelectronics Reliability 43(7): 1039-1045 (2003)
1995
2	EE	Eric Adler, John K. DeBrosse, Stephen F. Geissler, Steven J. Holmes, Mark D. Jaffe, Jeffrey B. Johnson, Charles W. Koburger III, Jerome B. Lasky, Brian Lloyd, Glen L. Miles, James S. Nakos, Wendell P. Noble Jr., Steven H. Voldman, Michael Armacost, Richard Ferguson: The evolution of IBM CMOS DRAM technology. IBM Journal of Research and Development 39(1-2): 167-188 (1995)
1		Donald G. Chesebro, James W. Adkisson, Lyman R. Clark, Steven N. Eslinger, Margaret A. Faucher, Steven J. Holmes, Raymond P. Mallette, Edward J. Nowak, Edward W. Sengle, Steven H. Voldman, Thomas W. Weeks: Overview of gate linewidth control in the manufacture of CMOS logic chips. IBM Journal of Research and Development 39(1-2): 189-200 (1995)

Coauthor Index

1	James W. Adkisson	[1]
2	Eric Adler	[2]
3	David C. Ahlgren	[4]
4	Michael Armacost	[2]
5	Peter Bendix	[8]
6	Jau-Wen Chen	[8]
7	Donald G. Chesebro	[1]
8	Lyman R. Clark	[1]
9	Douglas D. Coolbaugh	[4]
10	John K. DeBrosse	[2]
11	James S. Dunn	[4]
12	Steven N. Eslinger	[1]
13	Margaret A. Faucher	[1]
14	Natalie B. Feilchenfeld	[4]
15	Richard Ferguson	[2]
16	Gregory Freeman	[4]
17	Stephen F. Geissler	[2]
18	David R. Greenberg	[4]
19	Robert A. Groves	[4]
20	Fernando J. Guarín	[4]
21	Youssef Hammad	[4]
22	David L. Harame	[4]
23	Dean A. Herman Jr.	[4]
24	Steven J. Holmes	[1] [2]
25	Yoon Huh	[8]
26	Mark D. Jaffe	[2]
27	Jeffrey B. Johnson	[2]
28	Larry D. Johnson	[8]
29	Alvin J. Joseph	[4]
30	Sherry Suat Cheng Khoo	[3]
31	Charles W. Koburger III	[2]
32	Louis D. Lanzerotti	[4]
33	Jerome B. Lasky	[2]
34	Brian Lloyd	[2]
35	Raymond P. Mallette	[1]
36	Bernard S. Meyerson	[4]
37	Glen L. Miles	[2]
38	Kyungjin Min	[8]
39	James S. Nakos	[2]
40	Ravindra Narayan	[8]
41	Wendell P. Noble Jr.	[2]
42	Edward J. Nowak	[1]
43	Stephen A. St. Onge	[4]
44	Bradley A. Orner	[4]
45	Jae-Sung Rieh	[4]
46	Edward W. Sengle	[1]
47	Kenneth J. Stein	[4]
48	Seshadri Subbanna	[4]
49	Pee Ya Tan	[3]
50	Ping-Chuan Wang	[4]
51	Thomas W. Weeks	[1]
52	Michael J. Zierak	[4]

Colors in the list of coauthors