1997 |
5 | EE | Steven J. Holmes,
Peter H. Mitchell,
Mark C. Hakey:
Manufacturing with DUV lithography.
IBM Journal of Research and Development 41(1&2): 7-20 (1997) |
4 | EE | Jane M. Shaw,
Jeffrey D. Gelorme,
Nancy C. LaBianca,
Will E. Conley,
Steven J. Holmes:
Negative photoresists for optical lithography.
IBM Journal of Research and Development 41(1&2): 81-94 (1997) |
1995 |
3 | EE | Eric Adler,
John K. DeBrosse,
Stephen F. Geissler,
Steven J. Holmes,
Mark D. Jaffe,
Jeffrey B. Johnson,
Charles W. Koburger III,
Jerome B. Lasky,
Brian Lloyd,
Glen L. Miles,
James S. Nakos,
Wendell P. Noble Jr.,
Steven H. Voldman,
Michael Armacost,
Richard Ferguson:
The evolution of IBM CMOS DRAM technology.
IBM Journal of Research and Development 39(1-2): 167-188 (1995) |
2 | | Donald G. Chesebro,
James W. Adkisson,
Lyman R. Clark,
Steven N. Eslinger,
Margaret A. Faucher,
Steven J. Holmes,
Raymond P. Mallette,
Edward J. Nowak,
Edward W. Sengle,
Steven H. Voldman,
Thomas W. Weeks:
Overview of gate linewidth control in the manufacture of CMOS logic chips.
IBM Journal of Research and Development 39(1-2): 189-200 (1995) |
1 | | Charles W. Koburger III,
William F. Clark,
James W. Adkisson,
Eric Adler,
Paul E. Bakeman,
Albert S. Bergendahl,
Alan B. Botula,
W. Chang,
Bijan Davari,
John H. Givens,
Howard H. Hansen,
Steven J. Holmes,
David V. Horak,
Chung Hon Lam,
Jerome B. Lasky,
Stephen E. Luce,
Randy W. Mann,
Glen L. Miles,
James S. Nakos,
Edward J. Nowak,
Ghavam Shahidi,
Yuan Taur,
Francis R. White,
Matthew R. Wordeman:
A half-micron CMOS logic generation.
IBM Journal of Research and Development 39(1-2): 215-228 (1995) |