2005 |
3 | EE | T. Schram,
L.-Å. Ragnarsson,
G. Lujan,
W. Deweerd,
J. Chen,
W. Tsai,
K. Henson,
R. J. P. Lander,
J. C. Hooker,
J. Vertommen:
Performance improvement of self-aligned HfO2/TaN and SiON/TaN nMOS transistors.
Microelectronics Reliability 45(5-6): 779-782 (2005) |
2 | EE | W. Deweerd,
V. Kaushik,
J. Chen,
Y. Shimamoto,
T. Schram,
L.-Å. Ragnarsson,
A. Delabie,
L. Pantisano,
B. Eyckens,
J. W. Maes:
Potential remedies for the VT/Vfb-shift problem of Hf/polysilicon-based gate stacks: a solution-based survey.
Microelectronics Reliability 45(5-6): 786-789 (2005) |
1 | EE | G. S. Lujan,
W. Magnus,
L.-Å. Ragnarsson,
S. Kubicek,
Stefan De Gendt,
Marc M. Heyns,
K. De Meyer:
Modelling mobility degradation due to remote Coulomb scattering from dielectric charges and its impact on MOS device performance.
Microelectronics Reliability 45(5-6): 794-797 (2005) |