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2005 | ||
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2 | EE | S. Beckx, M. Demand, S. Locorotondo, K. Henson, M. Claes, V. Paraschiv, D. Shamiryan, P. Jaenen, W. Boullart, S. Degendt: Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development. Microelectronics Reliability 45(5-6): 1007-1011 (2005) |
1 | EE | T. Schram, L.-Å. Ragnarsson, G. Lujan, W. Deweerd, J. Chen, W. Tsai, K. Henson, R. J. P. Lander, J. C. Hooker, J. Vertommen: Performance improvement of self-aligned HfO2/TaN and SiON/TaN nMOS transistors. Microelectronics Reliability 45(5-6): 779-782 (2005) |
1 | S. Beckx | [2] |
2 | W. Boullart | [2] |
3 | J. Chen | [1] |
4 | M. Claes | [2] |
5 | S. Degendt | [2] |
6 | M. Demand | [2] |
7 | W. Deweerd | [1] |
8 | J. C. Hooker | [1] |
9 | P. Jaenen | [2] |
10 | R. J. P. Lander | [1] |
11 | S. Locorotondo | [2] |
12 | G. Lujan | [1] |
13 | V. Paraschiv | [2] |
14 | L.-Å. Ragnarsson | [1] |
15 | T. Schram | [1] |
16 | D. Shamiryan | [2] |
17 | W. Tsai | [1] |
18 | J. Vertommen | [1] |