L. J. Tang

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3EEF. Palumbo, G. Condorelli, S. Lombardo, K. L. Pey, C. H. Tung, L. J. Tang: Structure of the oxide damage under progressive breakdown. Microelectronics Reliability 45(5-6): 845-848 (2005)
2EEC. F. Tsang, C. Y. Li, A. Krishnamoorthy, Y. J. Su, H. Y. Li, L. Y. Wong, W. H. Li, L. J. Tang, K. Y. Ee: Impact of barrier deposition process on electrical and reliability performance of Cu/CVD low k SiOCH metallization. Microelectronics Journal 35(9): 693-700 (2004)
1EEK. L. Pey, C. H. Tung, M. K. Radhakrishnan, L. J. Tang, Y. Sun, X. D. Wang, W. H. Lin: Correlation of failure mechanism of constant-current-stress and constant-voltage-stress breakdowns in ultrathin gate oxides of nMOSFETs by TEM. Microelectronics Reliability 43(9-11): 1471-1476 (2003)

Coauthor Index

1G. Condorelli [3]
2K. Y. Ee [2]
3A. Krishnamoorthy [2]
4C. Y. Li [2]
5H. Y. Li [2]
6W. H. Li [2]
7W. H. Lin [1]
8S. Lombardo [3]
9F. Palumbo [3]
10K. L. Pey [1] [3]
11M. K. Radhakrishnan [1]
12Y. J. Su [2]
13Y. Sun [1]
14C. F. Tsang [2]
15C. H. Tung [1] [3]
16X. D. Wang [1]
17L. Y. Wong [2]

Colors in the list of coauthors

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)