C. Y. Li

2004
1	EE	C. F. Tsang, C. Y. Li, A. Krishnamoorthy, Y. J. Su, H. Y. Li, L. Y. Wong, W. H. Li, L. J. Tang, K. Y. Ee: Impact of barrier deposition process on electrical and reliability performance of Cu/CVD low k SiOCH metallization. Microelectronics Journal 35(9): 693-700 (2004)

Coauthor Index

1	K. Y. Ee	[1]
2	A. Krishnamoorthy	[1]
3	H. Y. Li	[1]
4	W. H. Li	[1]
5	Y. J. Su	[1]
6	L. J. Tang	[1]
7	C. F. Tsang	[1]
8	L. Y. Wong	[1]