2005 | ||
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2 | EE | C. F. Tsang, C. K. Chang, A. Krishnamoorthy, K. Y. Ee, Y. J. Su, H. Y. Li, W. H. Li, L. Y. Wong: A study of post-etch wet clean on electrical and reliability performance of Cu/low k interconnections. Microelectronics Reliability 45(3-4): 517-525 (2005) |
2004 | ||
1 | EE | C. F. Tsang, C. Y. Li, A. Krishnamoorthy, Y. J. Su, H. Y. Li, L. Y. Wong, W. H. Li, L. J. Tang, K. Y. Ee: Impact of barrier deposition process on electrical and reliability performance of Cu/CVD low k SiOCH metallization. Microelectronics Journal 35(9): 693-700 (2004) |
1 | C. K. Chang | [2] |
2 | K. Y. Ee | [1] [2] |
3 | A. Krishnamoorthy | [1] [2] |
4 | C. Y. Li | [1] |
5 | H. Y. Li | [1] [2] |
6 | W. H. Li | [1] [2] |
7 | Y. J. Su | [1] [2] |
8 | L. J. Tang | [1] |
9 | C. F. Tsang | [1] [2] |