P. K. Hurley

2005
4	EE	J. M. Decams, H. Guillon, C. Jiménez, M. Audier, J. P. Sénateur, C. Dubourdieu, O. Cadix, B. J. O'Sullivan, M. Modreanu, P. K. Hurley: Electrical characterization of HfO2 films obtained by UV assisted injection MOCVD. Microelectronics Reliability 45(5-6): 929-932 (2005)
3	EE	Q. Fang, I. Liaw, M. Modreanu, P. K. Hurley, I. W. Boyd: Post deposition UV-induced O2 annealing of HfO2 thin films. Microelectronics Reliability 45(5-6): 957-960 (2005)
2	EE	Y. Lu, Octavian Buiu, Steve Hall, P. K. Hurley: Optical and electrical characterization of hafnium oxide deposited by MOCVD. Microelectronics Reliability 45(5-6): 965-968 (2005)
2001
1	EE	B. J. O'Sullivan, P. K. Hurley, F. N. Cubaynes, P. A. Stolk, F. P. Widdershoven: Flat band voltage shift and oxide properties after rapid thermal annealing. Microelectronics Reliability 41(7): 1053-1056 (2001)

Coauthor Index

1	M. Audier	[4]
2	I. W. Boyd	[3]
3	Octavian Buiu	[2]
4	O. Cadix	[4]
5	F. N. Cubaynes	[1]
6	J. M. Decams	[4]
7	C. Dubourdieu	[4]
8	Q. Fang	[3]
9	H. Guillon	[4]
10	Steve Hall	[2]
11	C. Jiménez	[4]
12	I. Liaw	[3]
13	Y. Lu	[2]
14	M. Modreanu	[3] [4]
15	B. J. O'Sullivan	[1] [4]
16	J. P. Sénateur	[4]
17	P. A. Stolk	[1]
18	F. P. Widdershoven	[1]

Colors in the list of coauthors