I. W. Boyd
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2005
1
EE
Q. Fang
,
I. Liaw
,
M. Modreanu
,
P. K. Hurley
, I. W. Boyd: Post deposition UV-induced O
2
annealing of HfO
2
thin films.
Microelectronics Reliability 45
(5-6): 957-960 (2005)
Coauthor
Index
1
Q. Fang
[
1
]
2
P. K. Hurley
[
1
]
3
I. Liaw
[
1
]
4
M. Modreanu
[
1
]
Copyright ©
Sun May 17 03:24:02 2009 by
Michael Ley
(
ley@uni-trier.de
)