| |
| 2001 | ||
|---|---|---|
| 1 | EE | B. J. O'Sullivan, P. K. Hurley, F. N. Cubaynes, P. A. Stolk, F. P. Widdershoven: Flat band voltage shift and oxide properties after rapid thermal annealing. Microelectronics Reliability 41(7): 1053-1056 (2001) |
| 1 | F. N. Cubaynes | [1] |
| 2 | P. K. Hurley | [1] |
| 3 | B. J. O'Sullivan | [1] |
| 4 | P. A. Stolk | [1] |