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2001 | ||
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1 | EE | B. J. O'Sullivan, P. K. Hurley, F. N. Cubaynes, P. A. Stolk, F. P. Widdershoven: Flat band voltage shift and oxide properties after rapid thermal annealing. Microelectronics Reliability 41(7): 1053-1056 (2001) |
1 | F. N. Cubaynes | [1] |
2 | P. K. Hurley | [1] |
3 | B. J. O'Sullivan | [1] |
4 | P. A. Stolk | [1] |