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I. Liaw

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2005
1EEQ. Fang, I. Liaw, M. Modreanu, P. K. Hurley, I. W. Boyd: Post deposition UV-induced O2 annealing of HfO2 thin films. Microelectronics Reliability 45(5-6): 957-960 (2005)

Coauthor Index

1I. W. Boyd [1]
2Q. Fang [1]
3P. K. Hurley [1]
4M. Modreanu [1]

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