J.-Y. Tewg

2006
1	EE	S. Chatterjee, Yue Kuo, J. Lu, J.-Y. Tewg, P. Majhi: Electrical reliability aspects of HfO2 high-k gate dielectrics with TaN metal gate electrodes under constant voltage stress. Microelectronics Reliability 46(1): 69-76 (2006)

Coauthor Index

1	S. Chatterjee	[1]
2	Yue Kuo	[1]
3	J. Lu	[1]
4	P. Majhi	[1]