| |
| 1997 | ||
|---|---|---|
| 1 | EE | Jane M. Shaw, Jeffrey D. Gelorme, Nancy C. LaBianca, Will E. Conley, Steven J. Holmes: Negative photoresists for optical lithography. IBM Journal of Research and Development 41(1&2): 81-94 (1997) |
| 1 | Jeffrey D. Gelorme | [1] |
| 2 | Steven J. Holmes | [1] |
| 3 | Nancy C. LaBianca | [1] |
| 4 | Jane M. Shaw | [1] |