F. Campabadal

2006
2	EE	J. M. Rafí, E. Simoen, K. Hayama, A. Mercha, F. Campabadal, H. Ohyama, C. Claeys: Hot-carrier-induced degradation of drain current hysteresis and transients in thin gate oxide floating body partially depleted SOI nMOSFETs. Microelectronics Reliability 46(9-11): 1657-1663 (2006)
2002
1	EE	J. M. Rafí, B. Vergnet, F. Campabadal, C. Fleta, L. Fonseca, M. Lozano, C. Martínez, M. Ullán: Electrical characteristics of high-energy proton irradiated ultra-thin gate oxides. Microelectronics Reliability 42(9-11): 1501-1504 (2002)

Coauthor Index

1	C. Claeys	[2]
2	C. Fleta	[1]
3	L. Fonseca	[1]
4	K. Hayama	[2]
5	M. Lozano	[1]
6	C. Martínez	[1]
7	A. Mercha	[2]
8	H. Ohyama	[2]
9	J. M. Rafí	[1] [2]
10	E. Simoen	[2]
11	M. Ullán	[1]
12	B. Vergnet	[1]