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2005 | ||
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1 | EE | S. Beckx, M. Demand, S. Locorotondo, K. Henson, M. Claes, V. Paraschiv, D. Shamiryan, P. Jaenen, W. Boullart, S. Degendt: Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development. Microelectronics Reliability 45(5-6): 1007-1011 (2005) |
1 | S. Beckx | [1] |
2 | W. Boullart | [1] |
3 | S. Degendt | [1] |
4 | M. Demand | [1] |
5 | K. Henson | [1] |
6 | P. Jaenen | [1] |
7 | S. Locorotondo | [1] |
8 | V. Paraschiv | [1] |
9 | D. Shamiryan | [1] |