| |
| 2005 | ||
|---|---|---|
| 1 | EE | S. Beckx, M. Demand, S. Locorotondo, K. Henson, M. Claes, V. Paraschiv, D. Shamiryan, P. Jaenen, W. Boullart, S. Degendt: Implementation of high-k and metal gate materials for the 45nm node and beyond: gate patterning development. Microelectronics Reliability 45(5-6): 1007-1011 (2005) |
| 1 | S. Beckx | [1] |
| 2 | W. Boullart | [1] |
| 3 | M. Claes | [1] |
| 4 | S. Degendt | [1] |
| 5 | M. Demand | [1] |
| 6 | K. Henson | [1] |
| 7 | P. Jaenen | [1] |
| 8 | V. Paraschiv | [1] |
| 9 | D. Shamiryan | [1] |