| |
| 2005 | ||
|---|---|---|
| 2 | EE | Y.-L. Li, Zs. Tökei, Ph. Roussel, Guido Groeseneken, Karen Maex: Layout dependency induced deviation from Poisson area scaling in BEOL dielectric reliability. Microelectronics Reliability 45(9-11): 1299-1304 (2005) |
| 1 | EE | Zs. Tökei, Y.-L. Li, G. P. Beyer: Reliability challenges for copper low-k dielectrics and copper diffusion barriers. Microelectronics Reliability 45(9-11): 1436-1442 (2005) |
| 1 | G. P. Beyer | [1] |
| 2 | Guido Groeseneken | [2] |
| 3 | Y.-L. Li | [1] [2] |
| 4 | Karen Maex | [2] |
| 5 | Ph. Roussel | [2] |