G. P. Beyer
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2005
1
EE
Zs. Tökei
,
Y.-L. Li
, G. P. Beyer: Reliability challenges for copper low-k dielectrics and copper diffusion barriers.
Microelectronics Reliability 45
(9-11): 1436-1442 (2005)
Coauthor
Index
1
Y.-L. Li
[
1
]
2
Zs. Tökei
[
1
]
Copyright ©
Sun May 17 03:24:02 2009 by
Michael Ley
(
ley@uni-trier.de
)
