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Y.-L. Li

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2005
2EEY.-L. Li, Zs. Tökei, Ph. Roussel, Guido Groeseneken, Karen Maex: Layout dependency induced deviation from Poisson area scaling in BEOL dielectric reliability. Microelectronics Reliability 45(9-11): 1299-1304 (2005)
1EEZs. Tökei, Y.-L. Li, G. P. Beyer: Reliability challenges for copper low-k dielectrics and copper diffusion barriers. Microelectronics Reliability 45(9-11): 1436-1442 (2005)

Coauthor Index

1G. P. Beyer [1]
2Guido Groeseneken [2]
3Karen Maex [2]
4Ph. Roussel [2]
5Zs. Tökei [1] [2]

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)