| 1987 |
|---|
| 4 | EE | S. Yamamoto,
T. Kure,
M. Ohgo,
Teruo Matsuzawa,
S. Tachi,
H. Sunami:
A Two-Dimensional Etching Profile Simulator: ESPRIT.
IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 417-422 (1987) |
| 3 | EE | A. Moniwa,
Teruo Matsuzawa,
T. Ito,
H. Sunami:
A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect Environment.
IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 431-438 (1987) |
| 2 | EE | M. Ohgo,
Y. Takano,
A. Moniwa,
S. Yamamoto,
Y. Sakai,
H. Masuda,
H. Sunami:
A Two-Dimensional Integrated Process Simulator: SPIRIT-I.
IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 439-445 (1987) |
| 1 | EE | Teruo Matsuzawa,
A. Moniwa,
N. Hasegawa,
H. Sunami:
Two-Dimensional Simulation of Photolithography on Reflective Stepped Substrate.
IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 446-451 (1987) |
