1987 |
3 | EE | A. Moniwa,
Teruo Matsuzawa,
T. Ito,
H. Sunami:
A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect Environment.
IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 431-438 (1987) |
2 | EE | M. Ohgo,
Y. Takano,
A. Moniwa,
S. Yamamoto,
Y. Sakai,
H. Masuda,
H. Sunami:
A Two-Dimensional Integrated Process Simulator: SPIRIT-I.
IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 439-445 (1987) |
1 | EE | Teruo Matsuzawa,
A. Moniwa,
N. Hasegawa,
H. Sunami:
Two-Dimensional Simulation of Photolithography on Reflective Stepped Substrate.
IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 446-451 (1987) |