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A. Moniwa

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1987
3EEA. Moniwa, Teruo Matsuzawa, T. Ito, H. Sunami: A Three-Dimensional Photoresist Imaging Process Simulator for Strong Standing-Wave Effect Environment. IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 431-438 (1987)
2EEM. Ohgo, Y. Takano, A. Moniwa, S. Yamamoto, Y. Sakai, H. Masuda, H. Sunami: A Two-Dimensional Integrated Process Simulator: SPIRIT-I. IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 439-445 (1987)
1EETeruo Matsuzawa, A. Moniwa, N. Hasegawa, H. Sunami: Two-Dimensional Simulation of Photolithography on Reflective Stepped Substrate. IEEE Trans. on CAD of Integrated Circuits and Systems 6(3): 446-451 (1987)

Coauthor Index

1N. Hasegawa [1]
2T. Ito [3]
3H. Masuda [2]
4Teruo Matsuzawa [1] [3]
5M. Ohgo [2]
6Y. Sakai [2]
7H. Sunami [1] [2] [3]
8Y. Takano [2]
9S. Yamamoto [2]

Copyright © Sun May 17 03:24:02 2009 by Michael Ley (ley@uni-trier.de)