| |
| 1993 | ||
|---|---|---|
| 1 | Timothy R. Groves, John G. Hartley, Hans C. Pfeiffer, Denise Puisto, Donald K. Bailey: Electron beam lithography tool for manufacture of X-ray masks. IBM Journal of Research and Development 37(3): 411-420 (1993) | |
| 1 | Donald K. Bailey | [1] |
| 2 | John G. Hartley | [1] |
| 3 | Hans C. Pfeiffer | [1] |
| 4 | Denise Puisto | [1] |