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| 2005 | ||
|---|---|---|
| 2 | EE | Hideki Murakami, Wataru Mizubayashi, Hirokazu Yokoi, Atsushi Suyama, Seiichi Miyazaki: Electrical Characterization of Aluminum-Oxynitride Stacked Gate Dielectrics Prepared by a Layer-by-Layer Process of Chemical Vapor Deposition and Rapid Thermal Nitridation. IEICE Transactions 88-C(4): 640-645 (2005) |
| 1 | EE | Wataru Mizubayashi, Naoki Yasuda, Kenji Okada, Hiroyuki Ota, Hirokazu Hisamatsu, Kunihiko Iwamoto, Koji Tominaga, Katsuhiko Yamamoto, Tsuyoshi Horikawa, Toshihide Nabatame: Carrier separation analysis for clarifying carrier conduction and degradation mechanisms in high-k stack gate dielectrics. Microelectronics Reliability 45(7-8): 1041-1050 (2005) |
| 1 | Hirokazu Hisamatsu | [1] |
| 2 | Tsuyoshi Horikawa | [1] |
| 3 | Kunihiko Iwamoto | [1] |
| 4 | Seiichi Miyazaki | [2] |
| 5 | Hideki Murakami | [2] |
| 6 | Toshihide Nabatame | [1] |
| 7 | Kenji Okada | [1] |
| 8 | Hiroyuki Ota | [1] |
| 9 | Atsushi Suyama | [2] |
| 10 | Koji Tominaga | [1] |
| 11 | Katsuhiko Yamamoto | [1] |
| 12 | Naoki Yasuda | [1] |
| 13 | Hirokazu Yokoi | [2] |