|  |  | 
| 2005 | ||
|---|---|---|
| 1 | EE | Wataru Mizubayashi, Naoki Yasuda, Kenji Okada, Hiroyuki Ota, Hirokazu Hisamatsu, Kunihiko Iwamoto, Koji Tominaga, Katsuhiko Yamamoto, Tsuyoshi Horikawa, Toshihide Nabatame: Carrier separation analysis for clarifying carrier conduction and degradation mechanisms in high-k stack gate dielectrics. Microelectronics Reliability 45(7-8): 1041-1050 (2005) | 
| 1 | Tsuyoshi Horikawa | [1] | 
| 2 | Kunihiko Iwamoto | [1] | 
| 3 | Wataru Mizubayashi | [1] | 
| 4 | Toshihide Nabatame | [1] | 
| 5 | Kenji Okada | [1] | 
| 6 | Hiroyuki Ota | [1] | 
| 7 | Koji Tominaga | [1] | 
| 8 | Katsuhiko Yamamoto | [1] | 
| 9 | Naoki Yasuda | [1] |