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| 2005 | ||
|---|---|---|
| 1 | EE | Wataru Mizubayashi, Naoki Yasuda, Kenji Okada, Hiroyuki Ota, Hirokazu Hisamatsu, Kunihiko Iwamoto, Koji Tominaga, Katsuhiko Yamamoto, Tsuyoshi Horikawa, Toshihide Nabatame: Carrier separation analysis for clarifying carrier conduction and degradation mechanisms in high-k stack gate dielectrics. Microelectronics Reliability 45(7-8): 1041-1050 (2005) |
| 1 | Hirokazu Hisamatsu | [1] |
| 2 | Tsuyoshi Horikawa | [1] |
| 3 | Kunihiko Iwamoto | [1] |
| 4 | Wataru Mizubayashi | [1] |
| 5 | Toshihide Nabatame | [1] |
| 6 | Kenji Okada | [1] |
| 7 | Koji Tominaga | [1] |
| 8 | Katsuhiko Yamamoto | [1] |
| 9 | Naoki Yasuda | [1] |