| |
| 1997 | ||
|---|---|---|
| 1 | EE | Mordechai Rothschild, Anthony R. Forte, Roderick R. Kunz, Susan C. Palmateer, Janusz H. C. Sedlacek: Lithography at a wavelength of 193 nm. IBM Journal of Research and Development 41(1&2): 49-56 (1997) |
| 1 | Anthony R. Forte | [1] |
| 2 | Roderick R. Kunz | [1] |
| 3 | Mordechai Rothschild | [1] |
| 4 | Janusz H. C. Sedlacek | [1] |