| |
| 1997 | ||
|---|---|---|
| 1 | EE | Robert D. Allen, Gregory M. Wallraff, Donald C. Hofer, Roderick R. Kunz: Photoresists for 193-nm lithography. IBM Journal of Research and Development 41(1&2): 95-104 (1997) |
| 1 | Donald C. Hofer | [1] |
| 2 | Roderick R. Kunz | [1] |
| 3 | Gregory M. Wallraff | [1] |